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High-Vacuum Chamber for Thin-Film Synthesis

FinlandTenders notice for High-Vacuum Chamber for Thin-Film Synthesis. The reference ID of the tender is 128661489 and it is closing on 20 Nov 2025.

Tender Details

  • Country:
  • Summary: High-Vacuum Chamber for Thin-Film Synthesis
  • FIT Ref No: 128661489
  • Deadline: 20 Nov 2025
  • Financier:
  • Purchaser Ownership: Government
  • Tender Value: Refer Document
  • Notice Type: Tender
  • Document Ref. No.: 697754-2025
  • Purchaser's Detail:
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  • Description:
  • The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the deposition chamber will be available. Moreover, the chamber design will allow provisionally for future functional expansion including installing a thermal evaporator for thin film deposition and a load-lock chamber for transferring samples to the deposition chamber without vacuum cycle interruption. RFMS and HiPIM power supplies, as well as instrumentation for thin film thermal evaporation, and load-lock chamber are not part of this tender. HAL is a leading materials science environment in Finland. The current research at HAL focuses on materials of importance for nanotechnology, micro- and optoelectronics, fusion technology, and particle detectors. Material properties are studied by applying various ion beam-based techniques, as well as by computational means. With regards to thin-film synthesis, the HAL...
  • Documents:

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High-Vacuum Chamber for Thin-Film Synthesis - Finland Tender

The UNIVERSITY OF HELSINKI, a Government sector organization in , has announced a new tender for High-Vacuum Chamber for Thin-Film Synthesis. This tender is published on FinlandTenders under FIT Ref No: 128661489 and is categorized as a Tender. Interested and eligible suppliers are invited to participate by reviewing the tender documents and submitting their bids before the deadline on 2025-11-20.

The estimated tender value is Refer Document, and full details, including technical specifications and submission requirements, are provided in the official tender documents. Ensure all submissions meet the criteria outlined to be considered for evaluation.

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